THF cleaning for PMMA residue removal from graphene
In this work the effectiveness on tetrahydrofuran cleaning on PMMA residues left behind from the polymer supported transfer process of CVD grown graphene and its ability to remove surface doping from graphene were studied. The electronic properties of the studied graphene Hall bar devices fabricated...
| Main Author: | |
|---|---|
| Other Authors: | , , , , , |
| Format: | Master's thesis |
| Language: | eng |
| Published: |
2024
|
| Subjects: | |
| Online Access: | https://jyx.jyu.fi/handle/123456789/97060 |
| Summary: | In this work the effectiveness on tetrahydrofuran cleaning on PMMA residues left
behind from the polymer supported transfer process of CVD grown graphene and
its ability to remove surface doping from graphene were studied. The electronic
properties of the studied graphene Hall bar devices fabricated on a silicon dioxide
substrate were charted during different points of the cleaning process. The amount
of surface doping and the quality of the graphene was estimated using Raman
spectroscopy and the amount of PMMA residues was estimated using atomic force
microscopy. The electrical measurements and Raman spectroscopy showed that
before cleaning the devices were highly p-doped and that the doping was reduced
as a result of the cleaning. The suitability studied cleaning process for PMMA
residue removal could not be conclusively estimated from the obtained results, but
the process showed promise for removing ambient surface doping.
|
|---|