Transient sputtering method for estimating ion confinement times in ECRIS plasma

Elektronisyklotroniresonanssi-ionilähteillä (ECRIS) tuotetaan korkeasti varattuja ione- ja kiihdytinpohjaisen fysiikan tutkimuksen tarkoituksiin. Pitkät ionien säilöntäajat ovat välttämättömiä korkeasti varattujen ionien tuottamiseksi. Tässä Pro Gradussa testataan transienttimenetelmää ionien säi...

Full description

Bibliographic Details
Main Author: Marttinen, Miha
Other Authors: Matemaattis-luonnontieteellinen tiedekunta, Faculty of Sciences, Fysiikan laitos, Department of Physics, Jyväskylän yliopisto, University of Jyväskylä
Format: Master's thesis
Language:eng
Published: 2018
Subjects:
Online Access: https://jyx.jyu.fi/handle/123456789/59650
_version_ 1828193093422153728
author Marttinen, Miha
author2 Matemaattis-luonnontieteellinen tiedekunta Faculty of Sciences Fysiikan laitos Department of Physics Jyväskylän yliopisto University of Jyväskylä
author_facet Marttinen, Miha Matemaattis-luonnontieteellinen tiedekunta Faculty of Sciences Fysiikan laitos Department of Physics Jyväskylän yliopisto University of Jyväskylä Marttinen, Miha Matemaattis-luonnontieteellinen tiedekunta Faculty of Sciences Fysiikan laitos Department of Physics Jyväskylän yliopisto University of Jyväskylä
author_sort Marttinen, Miha
datasource_str_mv jyx
description Elektronisyklotroniresonanssi-ionilähteillä (ECRIS) tuotetaan korkeasti varattuja ione- ja kiihdytinpohjaisen fysiikan tutkimuksen tarkoituksiin. Pitkät ionien säilöntäajat ovat välttämättömiä korkeasti varattujen ionien tuottamiseksi. Tässä Pro Gradussa testataan transienttimenetelmää ionien säilöntäaikojen arviomiseksi sputteroimalla. Tutkielmassa esitellään tarpeellinen tausta plasmafysiikalle, ECR-ionilähteelle ominai- sille plasmailmiöille, sekä käytännön menetelmille ionien tuottamiseksi ECR-plasmassa. Kokeellisessa osiossa esitellään sputterointiin perustuva transienttimenetelmä ionien säi- löntäaikojen arvioimiseksi ionivirtojen transienttien aikavakioista. Aikavakioiden riippu- vuus ionilähteen operointiparametreistä analysoidaan nojaten teoreettiseen taustaan, ja sen havaitaan sopivan ionien sähköstaattiseen säilöntämalliin. Lisäksi työssä tutkitaan ionien tuottoaikoja soveltamalla sputterointimetodia nopeassa sputteroinnissa. Tuottoaikoja verrataan ionivirtojen saturaatioaikoihin, joita käytetään tyypillisesti radioaktiivisten ionisuihkujen tuoton rajakriteerinä. Havaitaan, että ionien tuottoajat ovat merkittävästi lyhyempiä kuin saturaatioajat, mikä on radioaktiivisten ionisuihkujen tuoton kannalta tärkeä havainto. Electron Cyclotron Resonance Ion Sources (ECRIS) are used for Highly Charged Ion (HCI) production for accelerator based physics research. A necessary condition for HCI production are long ion confinement times. In this thesis, a transient sputtering method for estimating the confinement times is tested. In this thesis, the necessary background of plasma physics, ECRIS-specific theoretical plasma phenomena, and practicalities of HCI production with the ECRIS are introduced. In the experimental section, a transient sputtering method for estimating ion confinement times based on the ion current transient decay times is presented. The parameter dependence of the decay times is analyzed relying on the theoretical background, and found to be in accordance with the electrostatic ion confinement model. Additionally, the ion production times are probed by applying the sputtering method in a fast sputtering experiment. The production times are compared to the ion current saturation times, which are typically used as limiting criteria for radioactive ion beam production. It is observed, that the ion production times are significantly shorter than the current saturation times, which is an important finding with respect to radioactive beam production.
first_indexed 2019-08-19T08:21:26Z
format Pro gradu
free_online_boolean 1
fullrecord [{"key": "dc.contributor.advisor", "value": "Tarvainen, Olli", "language": "", "element": "contributor", "qualifier": "advisor", "schema": "dc"}, {"key": "dc.contributor.advisor", "value": "Koivisto, Hannu", "language": "", "element": "contributor", "qualifier": "advisor", "schema": "dc"}, {"key": "dc.contributor.author", "value": "Marttinen, Miha", "language": "", "element": "contributor", "qualifier": "author", "schema": "dc"}, {"key": "dc.date.accessioned", "value": "2018-09-24T11:59:05Z", "language": "", "element": "date", "qualifier": "accessioned", "schema": "dc"}, {"key": "dc.date.available", "value": "2018-09-24T11:59:05Z", "language": "", "element": "date", "qualifier": "available", "schema": "dc"}, {"key": "dc.date.issued", "value": "2018", "language": "", "element": "date", "qualifier": "issued", "schema": "dc"}, {"key": "dc.identifier.uri", "value": "https://jyx.jyu.fi/handle/123456789/59650", "language": "", "element": "identifier", "qualifier": "uri", "schema": "dc"}, {"key": "dc.description.abstract", "value": "Elektronisyklotroniresonanssi-ionil\u00e4hteill\u00e4 (ECRIS) tuotetaan korkeasti varattuja ione-\r\nja kiihdytinpohjaisen fysiikan tutkimuksen tarkoituksiin. Pitk\u00e4t ionien s\u00e4il\u00f6nt\u00e4ajat ovat\r\nv\u00e4ltt\u00e4m\u00e4tt\u00f6mi\u00e4 korkeasti varattujen ionien tuottamiseksi. T\u00e4ss\u00e4 Pro Gradussa testataan\r\ntransienttimenetelm\u00e4\u00e4 ionien s\u00e4il\u00f6nt\u00e4aikojen arviomiseksi sputteroimalla.\r\n\r\nTutkielmassa esitell\u00e4\u00e4n tarpeellinen tausta plasmafysiikalle, ECR-ionil\u00e4hteelle ominai-\r\nsille plasmailmi\u00f6ille, sek\u00e4 k\u00e4yt\u00e4nn\u00f6n menetelmille ionien tuottamiseksi ECR-plasmassa.\r\nKokeellisessa osiossa esitell\u00e4\u00e4n sputterointiin perustuva transienttimenetelm\u00e4 ionien s\u00e4i-\r\nl\u00f6nt\u00e4aikojen arvioimiseksi ionivirtojen transienttien aikavakioista. Aikavakioiden riippu-\r\nvuus ionil\u00e4hteen operointiparametreist\u00e4 analysoidaan nojaten teoreettiseen taustaan, ja\r\nsen havaitaan sopivan ionien s\u00e4hk\u00f6staattiseen s\u00e4il\u00f6nt\u00e4malliin.\r\n\r\nLis\u00e4ksi ty\u00f6ss\u00e4 tutkitaan ionien tuottoaikoja soveltamalla sputterointimetodia nopeassa\r\nsputteroinnissa. Tuottoaikoja verrataan ionivirtojen saturaatioaikoihin, joita k\u00e4ytet\u00e4\u00e4n\r\ntyypillisesti radioaktiivisten ionisuihkujen tuoton rajakriteerin\u00e4. Havaitaan, ett\u00e4 ionien\r\ntuottoajat ovat merkitt\u00e4v\u00e4sti lyhyempi\u00e4 kuin saturaatioajat, mik\u00e4 on radioaktiivisten\r\nionisuihkujen tuoton kannalta t\u00e4rke\u00e4 havainto.", "language": "fi", "element": "description", "qualifier": "abstract", "schema": "dc"}, {"key": "dc.description.abstract", "value": "Electron Cyclotron Resonance Ion Sources (ECRIS) are used for Highly Charged Ion\r\n(HCI) production for accelerator based physics research. A necessary condition for HCI\r\nproduction are long ion confinement times. In this thesis, a transient sputtering method\r\nfor estimating the confinement times is tested.\r\n\r\nIn this thesis, the necessary background of plasma physics, ECRIS-specific theoretical\r\nplasma phenomena, and practicalities of HCI production with the ECRIS are introduced.\r\nIn the experimental section, a transient sputtering method for estimating ion confinement\r\ntimes based on the ion current transient decay times is presented. The parameter dependence of the decay times is analyzed relying on the theoretical background, and found to\r\nbe in accordance with the electrostatic ion confinement model.\r\n\r\nAdditionally, the ion production times are probed by applying the sputtering method\r\nin a fast sputtering experiment. The production times are compared to the ion current\r\nsaturation times, which are typically used as limiting criteria for radioactive ion beam\r\nproduction. It is observed, that the ion production times are significantly shorter than\r\nthe current saturation times, which is an important finding with respect to radioactive\r\nbeam production.", "language": "en", "element": "description", "qualifier": "abstract", "schema": "dc"}, {"key": "dc.description.provenance", "value": "Submitted by Riitta Pitk\u00e4nen (rpitkane@jyu.fi) on 2018-09-24T11:59:05Z\r\nNo. of bitstreams: 0", "language": "en", "element": "description", "qualifier": "provenance", "schema": "dc"}, {"key": "dc.description.provenance", "value": "Made available in DSpace on 2018-09-24T11:59:05Z (GMT). No. of bitstreams: 0\r\n Previous issue date: 2018", "language": "en", "element": "description", "qualifier": "provenance", "schema": "dc"}, {"key": "dc.format.extent", "value": "108", "language": "", "element": "format", "qualifier": "extent", "schema": "dc"}, {"key": "dc.format.mimetype", "value": "application/pdf", "language": null, "element": "format", "qualifier": "mimetype", "schema": "dc"}, {"key": "dc.language.iso", "value": "eng", "language": null, "element": "language", "qualifier": "iso", "schema": "dc"}, {"key": "dc.rights", "value": "In Copyright", "language": "en", "element": "rights", "qualifier": null, "schema": "dc"}, {"key": "dc.subject.other", "value": "ECRIS", "language": "", "element": "subject", "qualifier": "other", "schema": "dc"}, {"key": "dc.subject.other", "value": "ion confinement time", "language": "", "element": "subject", "qualifier": "other", "schema": "dc"}, {"key": "dc.subject.other", "value": "ion production", "language": "", "element": "subject", "qualifier": "other", "schema": "dc"}, {"key": "dc.title", "value": "Transient sputtering method for estimating ion confinement times in ECRIS plasma", "language": "", "element": "title", "qualifier": null, "schema": "dc"}, {"key": "dc.type", "value": "master thesis", "language": null, "element": "type", "qualifier": null, "schema": "dc"}, {"key": "dc.identifier.urn", "value": "URN:NBN:fi:jyu-201809244224", "language": "", "element": "identifier", "qualifier": "urn", "schema": "dc"}, {"key": "dc.type.ontasot", "value": "Pro gradu -tutkielma", "language": "fi", "element": "type", "qualifier": "ontasot", "schema": "dc"}, {"key": "dc.type.ontasot", "value": "Master\u2019s thesis", "language": "en", "element": "type", "qualifier": "ontasot", "schema": "dc"}, {"key": "dc.contributor.faculty", "value": "Matemaattis-luonnontieteellinen tiedekunta", "language": "fi", "element": "contributor", "qualifier": "faculty", "schema": "dc"}, {"key": "dc.contributor.faculty", "value": "Faculty of Sciences", "language": "en", "element": "contributor", "qualifier": "faculty", "schema": "dc"}, {"key": "dc.contributor.department", "value": "Fysiikan laitos", "language": "fi", "element": "contributor", "qualifier": "department", "schema": "dc"}, {"key": "dc.contributor.department", "value": "Department of Physics", "language": "en", "element": "contributor", "qualifier": "department", "schema": "dc"}, {"key": "dc.contributor.organization", "value": "Jyv\u00e4skyl\u00e4n yliopisto", "language": "fi", "element": "contributor", "qualifier": "organization", "schema": "dc"}, {"key": "dc.contributor.organization", "value": "University of Jyv\u00e4skyl\u00e4", "language": "en", "element": "contributor", "qualifier": "organization", "schema": "dc"}, {"key": "dc.subject.discipline", "value": "Fysiikka", "language": "fi", "element": "subject", "qualifier": "discipline", "schema": "dc"}, {"key": "dc.subject.discipline", "value": "Physics", "language": "en", "element": "subject", "qualifier": "discipline", "schema": "dc"}, {"key": "yvv.contractresearch.funding", "value": "0", "language": "", "element": "contractresearch", "qualifier": "funding", "schema": "yvv"}, {"key": "dc.type.coar", "value": "http://purl.org/coar/resource_type/c_bdcc", "language": null, "element": "type", "qualifier": "coar", "schema": "dc"}, {"key": "dc.rights.accesslevel", "value": "openAccess", "language": null, "element": "rights", "qualifier": "accesslevel", "schema": "dc"}, {"key": "dc.type.publication", "value": "masterThesis", "language": null, "element": "type", "qualifier": "publication", "schema": "dc"}, {"key": "dc.subject.oppiainekoodi", "value": "4021", "language": "", "element": "subject", "qualifier": "oppiainekoodi", "schema": "dc"}, {"key": "dc.subject.yso", "value": "ionit", "language": "", "element": "subject", "qualifier": "yso", "schema": "dc"}, {"key": "dc.subject.yso", "value": "plasmafysiikka", "language": "", "element": "subject", "qualifier": "yso", "schema": "dc"}, {"key": "dc.subject.yso", "value": "ions", "language": "", "element": "subject", "qualifier": "yso", "schema": "dc"}, {"key": "dc.subject.yso", "value": "plasma physics", "language": "", "element": "subject", "qualifier": "yso", "schema": "dc"}, {"key": "dc.format.content", "value": "fulltext", "language": null, "element": "format", "qualifier": "content", "schema": "dc"}, {"key": "dc.rights.url", "value": "https://rightsstatements.org/page/InC/1.0/", "language": null, "element": "rights", "qualifier": "url", "schema": "dc"}, {"key": "dc.type.okm", "value": "G2", "language": null, "element": "type", "qualifier": "okm", "schema": "dc"}]
id jyx.123456789_59650
language eng
last_indexed 2025-03-31T20:01:48Z
main_date 2018-01-01T00:00:00Z
main_date_str 2018
online_boolean 1
online_urls_str_mv {"url":"https:\/\/jyx.jyu.fi\/bitstreams\/3bb01897-4e19-4d81-b656-29db4b9ac216\/download","text":"URN:NBN:fi:jyu-201809244224.pdf","source":"jyx","mediaType":"application\/pdf"}
publishDate 2018
record_format qdc
source_str_mv jyx
spellingShingle Marttinen, Miha Transient sputtering method for estimating ion confinement times in ECRIS plasma ECRIS ion confinement time ion production Fysiikka Physics 4021 ionit plasmafysiikka ions plasma physics
title Transient sputtering method for estimating ion confinement times in ECRIS plasma
title_full Transient sputtering method for estimating ion confinement times in ECRIS plasma
title_fullStr Transient sputtering method for estimating ion confinement times in ECRIS plasma Transient sputtering method for estimating ion confinement times in ECRIS plasma
title_full_unstemmed Transient sputtering method for estimating ion confinement times in ECRIS plasma Transient sputtering method for estimating ion confinement times in ECRIS plasma
title_short Transient sputtering method for estimating ion confinement times in ECRIS plasma
title_sort transient sputtering method for estimating ion confinement times in ecris plasma
title_txtP Transient sputtering method for estimating ion confinement times in ECRIS plasma
topic ECRIS ion confinement time ion production Fysiikka Physics 4021 ionit plasmafysiikka ions plasma physics
topic_facet 4021 ECRIS Fysiikka Physics ion confinement time ion production ionit ions plasma physics plasmafysiikka
url https://jyx.jyu.fi/handle/123456789/59650 http://www.urn.fi/URN:NBN:fi:jyu-201809244224
work_keys_str_mv AT marttinenmiha transientsputteringmethodforestimatingionconfinementtimesinecrisplasma