Ultra-flat giant grain Cu film atop α-Al2O3 (0001) for apCVD synthesis of graphene
Graphene microelectronic devices are still in the research phase. Consistent production of such small-scale structures requires increasingly higher quality graphene. Commonly, graphene is grown by chemical vapor deposition (CVD) on the surface of a substrate catalyst. Defects on the catalyst are...
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| Muut tekijät: | , , , , , |
| Aineistotyyppi: | Pro gradu |
| Kieli: | eng |
| Julkaistu: |
2018
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| Aiheet: | |
| Linkit: | https://jyx.jyu.fi/handle/123456789/59079 |