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080916s2008 fi |||||sm |||||||eng|| |
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|a 978-951-39-3318-0
|q PDF
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|a 1069270
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|a eng
|b heb
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|a 53
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|a Gorelick, Sergey.
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|a MeV ion beam lithography of high aspect ratio structures with a focused or aperture-shaped beam for applications in biomedical studies and microfluidics /
|c by Sergey Gorelick.
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|a Jyväskylä :
|b University of Jyväskylä,
|c 2008.
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| 300 |
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|a 65 sivua
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| 336 |
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|a teksti
|b txt
|2 rdacontent
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| 337 |
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|a tietokonekäyttöinen
|b c
|2 rdamedia
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| 338 |
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|a verkkoaineisto
|b cr
|2 rdacarrier
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|a Research report / Department of Physics, University of Jyväskylä,
|x 0075-465X ;
|v 9/2008
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| 502 |
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|a Väitöskirja
|c Jyväskylän yliopisto, fysiikka.
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0 |
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|a Vain tiivistelmäosa
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| 530 |
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|a Myös painettuna (ISBN 978-951-39-3317-3).
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| 579 |
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|a XLUETTELOITU
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| 591 |
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|i 114
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| 650 |
|
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|a fysiikka
|2 yso/fin
|0 http://www.yso.fi/onto/yso/p900
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| 830 |
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|a Research report / Department of Physics, University of Jyväskylä,
|x 0075-465X ;
|v 9/2008.
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| 856 |
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|u http://urn.fi/URN:ISBN:978-951-39-3318-0
|u URN:ISBN:978-951-39-3318-0
|q PDF
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| 999 |
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|c 1069270
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