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|a 978-951-39-3142-1
|q PDF
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|a 1053241
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|a eng
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|a 53
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|a Hahto, Sami.
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|a Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications /
|c Sami Hahto.
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| 260 |
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|a Jyväskylä :
|b University of Jyväskylä,
|c 2003.
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| 300 |
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|a 129 sivua
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| 336 |
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|a teksti
|b txt
|2 rdacontent
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| 337 |
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|a tietokonekäyttöinen
|b c
|2 rdamedia
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| 338 |
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|a verkkoaineisto
|b cr
|2 rdacarrier
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|a Research report / Department of Physics, University of Jyväskylä,
|x 0075-465X ;
|v no. 4/2003
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| 502 |
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|a Väitöskirja
|c Jyväskylän yliopisto, fysiikka.
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| 530 |
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|a Myös painettuna (ISBN 951-39-1574-3).
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| 538 |
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|a Internet-yhteys, WWW-selain, Adobe Reader.
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| 579 |
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|a XLUETTELOITU
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|a Research report / Department of Physics, University of Jyväskylä,
|x 0075-465X ;
|v no. 4/2003.
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| 856 |
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|u http://urn.fi/URN:ISBN:978-951-39-3142-1
|u URN:ISBN:978-951-39-3142-1
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|i 114
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|c 1053241
|d 1053241
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